- Sunday, August 7; 8:30 AM - 5:00 PM
- Additional registration fees apply; see M&M 2011 website for details.
- A certificate of participation will be issued to each participant.
Z09: Opportunities, Artifacts and Interpretation of Aberration-Corrected Electron Microscopy Data
Organizers: Philip Batson, David Muller, Lawrence Allard, Paul Voyles, Miofang Chi, and Mike O'Keefe
Description: This one-day pre-meeting workshop, organized by the MSA Aberration-Corrected Electron Microscopy (ACEM) FIG, will be a forum for the discussion of the latest advances and solutions to problems associated with application of aberration correction technology in transmission/scanning electron microscopy. The format will consist of platform presentations by both invited and contributed speakers, together with a working lunch - poster session. Invited speakers will introduce innovations and issues, while contributors (both platform and poster) are sought to highlight practical experiences and solutions to problems encountered during the application of ACEM to on-going experimental studies. The topical areas for this workshop include: new corrector designs, image collection/interpretation, and innovations in spectroscopies or new signal types, artifacts and practical experiences in applications of ACEM to difficult situations such as hard/soft materials and in-situ experiments. All platform presentations will be intentionally kept short (~15-20 minutes) to allow the maximum amount of interaction and information flow among attendees.