In-Week Intensive Workshops

Organizer: Mike Marko

  • These In-depth courses will be held Monday-Thursday from 1:00 PM - 5:00 PM
  • A certificate of participation will be issued to each participant.
  • The course fee includes a discounted full meeting registration to M&M 2011.
  • Additional registration fees apply; see online registration form for details.
  • Afternoon coffee breaks included each day.

X-23: Introduction to SEM Imaging and X-ray Compositional Analysis

David Joy
Distinguished Professor, University of Tennessee,Knoxville and Distinguished Scientist, Oak Ridge National Laboratory.
  Brad Thiel
Associate Professor of Nanoscience Research, UAlbany College of Nanoscale Science & Engineering

This introductory level workshop will involve classroom lectures and live demonstrations. The SEM topics will be taught by David Joy and will cover basic instrument operation and imaging modes. The EDS topics will be taught by Brad Thiel and will cover basic compositional analysis using an SEM with energy dispersive x-ray spectrometer. The lessons in the lectures will be complemented with demonstrations of SEM operation and x-ray microanalysis. Demonstrated topics will include the effects of working distance, accelerating voltage, probe size, imaging detector, detector bias, probe current, dead time, detector choice, sample geometry, etc.

Topics to be covered:

  • Instrument features
  • Operation basics
  • Sample preparation
  • Spectral optimization
  • Qualitative and quantitative analysis


NaCl recrystallized in the ESEM, overlaid with an EDX spectrum of Pt.

David Joy has joint appointments as a Distinguished Professor at the University of Tennessee,Knoxville and as Distinguished Scientist at Oak Ridge National Laboratory. He has written and edited nine books and 400 papers in the areas of Scanning Electron Microscopy, X-ray microanalysis, Monte Carlo modeling of electron interactions with solids, and associated topics. He has lectured at the Lehigh Electron Microscopy Schools every year sine 1975 and conducted short courses in SEM in more than a dozen countries world wide. He is a past-President of MSA, and is current Editor in Chief of SCANNING.

Brad Thiel is a Professor at the College of Nanoscale Science and Engineering at the University at Albany. Additionally, he is the Director of the Advanced Metrology Program at SEMATECH. As devices, structures, and particularly defects approach the nanometer scale, it becomes more and more critical to understand and measure structure — property relationships on atomic dimensions. Accordingly, his research centers on the development of new characterization and metrology techniques using electron and ion beams, x-rays and optical methods. He has authored over 120 papers related to microscopy and is a lecturer at the Lehigh Microscopy School.

X-24 — Nanomaterial Microscopy and Microanalysis: Tools and Preparation

Phillip E. Russell
Distinguished Professor of Science Education and Physics at Appalachian State University, a Director of MSA, Education Chair for MAS, and President of the Appalachian Regional Microscopy Society.
  Donovan N. Leonard
Electron microscopist affiliated with both the University of Tennessee, Knoxville, Dept. of Materials Science & Engineering and the STEM group, Materials Science Division, Oak Ridge National Laboratory.

With the wide variety of analytical instrumentation available, the selection of the correct "tool" for analysis of nanomaterials is critical. By introducing various microscopy and microanalysis methods this workshop should provide a solid foundation for nanomaterial characterization for the beginning to intermediate investigator. The importance of choosing the proper preparation technique, to minimize introduction of artifacts and ensure that representative samples are identified for subsequent analysis, will also be discussed.

Topics to be covered:

  • Choosing the proper preparation technique
  • Minimizing the introduction of artifacts
  • Ensuring that representative samples are identified for subsequent analysis
  • Tools to be discussed:
  • SEM, ESEM, and EBSD; FESEM: X-ray Microanalysis
  • TEM and HRTEM; STEM/EELS: Nanoanalysis
  • FIB: Sample Prep and Nanofabrication
  • AFM: Imaging and Nanofabrication


Thin film of ZnO containing Au nanodots (bright contrast hexagons), prepared for 360° STEM Z-contrast imaging by FIB milling

Phillip E. Russell is the Distinguished Professor of Science Education and Physics at Appalachian State University. He spent 21 years of his career at NC State University where he was Professor of Materials Science and Engineering, and funding Director of the Analytical Instrumentation Facility. He has been actively teaching both University and specialty short courses in microscopy and microanalysis for the past 25 years. He is a Director of MSA, Education Chair for MAS, and President of the Appalachian Regional Microscopy Society.

Donovan N. Leonard is an electron microscopist affiliated with the Dept. of Materials Science & Engineering at University of Tenessee, Knoxville and working closely with the STEM group at Oak Ridge National Laboratory. He holds a Ph.D., M.S. and B.S. degree in Materials Science & Engineering from North Carolina State University in Raleigh, NC and researched bio-related nanotechnologies for his dissertation using state-of-the-art electron microscopy techniques. He is also currently an instructor for the Duke University Talent Identification Program and teaches both classroom and online Nanotechnology courses for high school students.

X-25 Theory and Techniques of Aberration-Corrected Microscopy

Harald Rose, Mike O'Keefe, Andy Lupini, and Edgar Voekl

Each day of four days of the course will cover a different topic. (1) Aberration correction: Origin and classification of aberrations; effects on contrast and resolution; correction of axial and field aberrations; design of aberration correctors and aplanats. (2) Atomic-resolution TEM: Image formation and focal-series reconstruction to correct aberrations and extend resolution to the information limit. (3) Introduction to STEM: Aberrations, imaging modes in STEM, reciprocity, coherence, Ronchigrams and measuring aberrations. (4) Electron Holography: History and key elements of holography; holographic reconstruction—challenges, data acquisition, processing, and selected applications.

Topics to be covered:

  • Theory of aberration correction and design of correctors
  • Atomic-resolution TEM: image formation and focal-series reconstruction
  • Atomic-resolution STEM: theory and practice
  • Holographic reconstruction methods and applications


Diagram of sextupole corrector for spherical aberration
 
 

Hologram of MgO particles with interference
fringes indicating the image phase

Instructors

Harald H. Rose

Harald H. Rose is an emeritus professor of the Technical University Darmstadt, Germany. His work on theoretical electron optics, started under the supervision of Otto Scherzer, led to the design of the aberration correctors now realized by his students, led by Max Haider at CEOS GmbH. He has 105 patents on scientific instruments and electron optical components. He received his Ph.D. degree in 1964 from this University with a thesis on theoretical electron optics under the supervision of Professor Otto Scherzer. From 1976-1980 he was a Principal Research Scientist at The New York State Department of Health and spend sabbaticals at in 1973-74 at the E. Fermi Institute, University of Chicago, and 1995-96 at both Cornell University and the University of Maryland. From 1980-2000 he was Professor in the Department of Physics of the University of Darmstadt. After his retirement he was a Research Fellow in the Materials Science and Technology Division, Oak Ridge National Laboratory (2000-01), Department of Materials Science, Argonne National Laboratory (2001-02), and at the Advanced Light Source, Lawrence Berkeley National Laboratory (2003-05). His main research activities are in theoretical electron optics, especially aberration correction, theory of electron scattering and image formation in EM. He has published more than 200 reviewed articles in scientific journals, 10 major review articles and is inventor of 105 patents on scientific instruments and electron optical components partly manufactured by various companies.

 
Michael A. O'Keefe

Michael A. O'Keefe (Mike) is a physicist well-known for his work in materials science and electron microscopy. He is perhaps best recognized for his creation of the seminal computer code for the modeling of high-resolution transmission electron microscope (HRTEM) images. Mike designed and developed the one-Ångström microscope (OÅM) for the National Center for Electron Microscopy at Lawrence Berkeley National Laboratory, and was successful in breaking the "one-Ångström barrier" to HRTEM resolution by a combination of hardware and software correction of microscope aberrations. He produced the first HRTEM images to show carbon atoms separated by less than one Ångström in diamond (0.89 Å) and silicon atoms in crystalline silicon (0.78 Å). His OÅM is the only HRTEM that has successfully imaged the smallest metal atoms (lithium, in lithium battery materials.) Mike was MSA President in 2007.

 
Andrew R. Lupini

Andrew R. Lupini (Andy) earned his PhD at the Cavendish Laboratory, working under Dr. A.L. Bleloch (currently director of the UK SuperSTEM facility) and Prof L.M. Brown (F.R.S.). His method to measure aberrations developed with Drs. N. Dellby and O.L. Krivanek of Nion Co. is widely used in STEM aberration correctors. He was one of the first workers to obtain direct sub-Ångström high-angle annular dark-field (HA-ADF) images on an aberration-corrected STEM, and is now part of the DOE TEAM project to develop the next generation of aberration corrector. Andy is currently a staff member in Dr. S.J. Pennycook's group at Oak Ridge National Laboratory.

 
Edgar Voelkl

Edgar Voelkl is a leading expert in electron-optical and light-optical holography, is editor of "Introduction to Electron Holography," author of the software "HoloWorks", and holds several patents in the area of holography and specifically for a design of a dedicated electron holography microscope.