M&M 2017

X61 Focused Ion Beam Applications and Equipment Developments

Sunday, August 6, 2017 * 10:00 AM – 5:00 PM
Included in Registration Fee: Lunch, PM Break

Organized by the Focused Ion Beam (FIB) Focused Interest Group

Nicholas Antoniou, Revera
Srinivas Subramaniam, Intel Corporation

Focused Ion Beam technology is used in a variety of fields from electronics to life sciences. The applications space can be divided into categories such as cryogenic FIB, Direct-write lithography, 3D structure creation etc. The topics will be grouped together into sessions as follows:

  • TEM Sample prep
  • Cryogenic FIB-SEM
  • FIB Lithography and general patterning
  • Gas Assisted etching and deposition
  • Instrumentation, other

One hour will be allotted to each category with 2-3 papers and 20 minutes of open discussion. At the end of the congress, posters will be set up for informal interaction with the authors and participants.

Thank You to our Sponsors:


2017 Sponsors