X61 Focused Ion Beam Applications and Equipment Developments

Sunday, August 6, 2017 * 10:00 AM – 5:00 PM
Included in Registration Fee: Lunch, PM Break

Organized by the Focused Ion Beam (FIB) Focused Interest Group

Organizers:
Nicholas Antoniou, Revera
Srinivas Subramaniam, Intel Corporation

Focused Ion Beam technology is used in a variety of fields from electronics to life sciences. The applications space can be divided into categories such as cryogenic FIB, Direct-write lithography, 3D structure creation etc. The topics will be grouped together into sessions as follows:

• TEM Sample prep
• Cryogenic FIB-SEM
• FIB Lithography and general patterning
• Gas Assisted etching and deposition
• Instrumentation, other

One hour will be allotted to each category with 2-3 papers and 20 minutes of open discussion. At the end of the congress, posters will be set up for informal interaction with the authors and participants.

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